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        <datestamp>2021-12-13T01:03:21Z</datestamp>
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          <dc:title>Drain and Transfer Characteristics of Al (6 mol %) Doped PbTiO3 Thin Film Transistor</dc:title>
          <dc:creator>May Aye Khaing</dc:creator>
          <dc:creator>Pwint Yee Thein</dc:creator>
          <dc:creator>Than Than Win</dc:creator>
          <dc:creator>Yin Maung Maung</dc:creator>
          <dc:creator>Ko Ko Kyaw Soe</dc:creator>
          <dc:description>Al doped PbTiO3 powder was firstly prepared by&#13; high temperature solid state reaction route. Structural and&#13; microstructural analysis were studied by X-ray diffraction (XRD)&#13; and scanning electron microscopy (SEM)). Fabrication process of&#13; a single-transistor type ferroelectric field effect transistor&#13; (1TFeFET) memory with PbTi(1-x)Al(x)O3 (PTA) films had been&#13; carried out. Electrical characteristics (drain &amp; transfer) of all&#13; films were measured. According to the experimental results the&#13; laboratory-prepared transistors were utilized for 1T of&#13; NVFRAM.</dc:description>
          <dc:date>2016</dc:date>
          <dc:identifier>http://hdl.handle.net/20.500.12678/0000002467</dc:identifier>
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