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        <identifier>oai:meral.edu.mm:recid/2442</identifier>
        <datestamp>2021-12-13T03:11:08Z</datestamp>
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          <dc:title>Effect of GaP and In0.4Ga0.6P Insertion Layers on the Properties of InP Nanostructures Metal-Organic Vapor Phase Epitaxy</dc:title>
          <dc:creator>Soe Soe Han</dc:creator>
          <dc:creator>Panyakeow, Somsak</dc:creator>
          <dc:creator>Ratanathammaphan, Somchai</dc:creator>
          <dc:creator>Higo, Akio</dc:creator>
          <dc:creator>Yunpeng, Wang</dc:creator>
          <dc:creator>Deura, Momoko</dc:creator>
          <dc:creator>Sugiyama, Masakasu</dc:creator>
          <dc:creator>Nakano, Yoshiaki</dc:creator>
          <dc:description>The effect of increasing GaP and InGaP Insertion layers thickness (0-4) monolayers (MLs) to improve the structural and optical properties of InP self-assembled quantum dots (SAQDs) on GaAs (001) substrate grown by metal-organic vapor phase epitaxy was reported . The growth of thin GaP and InGaP insertion layers between In0.49Ga0.51P buffer and InP QDs layer reduced the mean height and size fluctuation and increased the density of InP QDs. A maximum QDs density of 4.2 x 109 cm-2 and better and smaller QDs size and uniformity had been achieved at 2 ML GaP and InGaP insertion layers. The blueshift of the PL peak was enhanced by insertion of GaP and InGaP layers. Due to InGaP insertion layer, a more blue-shift of the PL peak emission was also observed. InGaP insertion layer led to better QDs quality and higher PL intensity compare to that of GaP insertion layer.</dc:description>
          <dc:date>2010</dc:date>
          <dc:identifier>http://hdl.handle.net/20.500.12678/0000002442</dc:identifier>
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